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Allows the deposition of metals, alloys, ceramic, and polymer thin films onto a wide range of substrate materials.

100% environmentally green process unlike tradition chrome plating.It can applied on any thermoplastic, thermoset metal and rubber material even TPU /TPO

What is Magnetron Sputtering Coating

Physical vapor deposition (PVD) describes a variety of vacuum deposition methods which can be used to produce thin films and coatings. PVD is characterized by a process in which the material goes from a condensed phase to a vapor phase and then back to a thin film condensed phase. The most common PVD processes are sputtering and evaporation.

Thus, PVD by Sputtering is a term used to refer to a physical vapor deposition (PVD) technique wherein atoms or molecules are ejected from a target material by high-energy particle bombardment so that the ejected atoms or molecules can condense on a substrate as a thin film.


Magnetron Sputtering Coating Process

  • Use Large area targets which gives uniform thickness over the wafer
  • Control the thickness by deposition time and other parameters
  • Even materials with very high melting points are easily sputtered
  • Sputtered film typically have a better adhesion on the substrate
  • Sputtering can be performed top-down
  • Ions are generated and directed at a target
  • The ions sputter targets atoms
  • The ejected atoms are transported to the substrate
  • Atoms condense and form a thin film

Advantages of Magnetron Sputtering Coating

  • Environment- Friendly process and coatings
  • No chemical disposals
  • No use of Cr6 ,Ni, Pb, Hg and any other toxic components
  • It can applied on any thermoplastic, thermoset metal and rubber material even TPU /TPO (flexible material)
  • It can be given any kind of color with high gloss / low gloss.